SPUTTERING SYSTEM

規格

• Description : This is a horizontal inline sputtering system which can deposit ZnO + Ag + Ti films on the glass substrates.
• Substrate Size : 1100mm x 1400mm x 3~5mm
• Tact Time : 80sec per substrate
• System configuration :
  •  (1) Loading chamber
  •  (2) Heating chamber
  •  (3) Sputtering chamber 1
  •  (4) Intermediate isolation chamber
  •  (5) Sputtering chamber 2 (total α cathode * 7 sets)
  •  (6) Isolation chamber
  •  (7) Unloading chamber